본문바로가기

PRODUCT

Differentiated technology and
industry-leading expertise.

Poly-Si-Ring

Multi-Ring

Descriptions

The Gas flow inside the Chamber determines the Gas distribution and Etching uniformity.

Induction of Natural Gas Emissions by Down Flow with the direction of Slot as the lower part

->Gas diffusivity is improved.

View more information

Specifications

속성

Material

Poly crystalline  

Outer Diameter

440mm ~ 600mm

Resistance(Ω.㎝)

Low resolution (<0.02) / Medium resolution  (1~4)

Surface State

Polishing, lapping, grinding

Surface Flatness

< 5㎛

Processing Precision

< 10㎛

Quality

No chipping, scratch, cracking, contamination, pigmentation  


SITEMAP