Aluminum Oxide
Aluminum Oxide
Description
In general, high-purity Al2O3 has purity of 99.5% or higher, and includes particulate matter (<1 um) by at least 80%.
Applications
Dry etching and CVD for semiconductor process
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Specifications
Item | Description |
|---|---|
Density (g/cm³) | 3.9 |
Bending Strength (MPa) | 17.2 |
Vickers Hardness (GPa) | 30 |
Thermal Conductivity (W/mK, @20°C) | 15 x |
